| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a new compound having a protective group capable of being cleaved by the action of an acid and useful as an acid generator for a resist containing a resin which becomes alkaline soluble after the cleavage. SOLUTION: A compound of formula I [R<1> is a (substituted) alkylene, a (substituted) alkenylene or a divalent group of a (substituted) cyclic hydrocarbon; R<2> is a (substitute) cycloalkyl; (n)=0-6; (CH2 )n R<2> is not a residual group of camphor], e.g. N-(cyclohexanesulfonyloxy)succinimide. The objective compound of formula I is obtained by reacting a cyclic N-hydroxyimino compound of formula II with a sulfonic acid chloride of the formula R<2> (CH2 )n SO2 C] under a basic condition. A resist composition obtained by using the compound as an acid-generating agent holds thermal resistance, a residual membrane fraction, applicability, etc., at high levels, is excellent in sensitivity, the degree of resolution and profile, and has suppressed dimensional variations of patterns.</p> |
