摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a photosensitive solution requiring no oxygen-intercepting film and enhanced in heat resistance by incorporating a resin specified in acid value and weight average molecular weight and a photopolymerization initiator containing a specified carbazole type photopolymerization initiator in a specified weight percentage. SOLUTION: This photosensitive solution contains a resin having an acid value of 20-300 and a weight average molecular weight of 1,500-200,000, a pigment, a monomer having a photopolymerizable unsaturated bond in the molecule, and a photopolymerization initiator. This photopolymerization initiator contains the carbazole type photopolymerization initiators represented by formula I-II in an amount of 30-100weight% of the total photopolymerization initiators, and in formulae I-III, each of R<1> -R<7> except R<4> is an H atom or a 1-20C alkyl group or the like; X<1> is a group of formula IV; Y<1> is an H atom or a group of formula V; Y<2> is an H or halogen atom or the like; R<4> is a direct bond or a 1-10C alkhylene group; X<2> is a -O-R<8> -O- group or the like; and R<8> is a 2-10C alkylene group.</p> |