摘要 |
<p>PROBLEM TO BE SOLVED: To reduce residual attraction below a level causing no problem by equalizing the quantity of charges stored at the attracting part of a dielectric layer immediately before interrupting DC voltage supply to an electrode. SOLUTION: The electrode 11 of an electrostatic chuck 10 is provided with an internal channel 21 for cooling medium and an annular recess for forming an electrode 12 is made in the upper surface thereof. The electrode 12 is then provided in the annular recess through an insulation layer 13 by spray deposition followed by formation of a dielectric layer for electrostatic attraction, i.e., an insulation layer 14, on the surface of the electrodes 11, 12 by spray deposition. Subsequently, a DC voltage is applied from DC power supplies 8a, 8b between the electrodes 11, 12 and bringing the potential of charges stored at the attracting part of the insulation layer 14 to same level immediately before interrupting DC voltage supply. According to the arrangement, residual attraction can be reduced below a level causing no problem and the waiting time for separating the sample from an electrostatic chuck 10 can be shortened.</p> |