发明名称 Multi-layer wiring structure having varying-sized cutouts
摘要 An integrated circuit having a multi-layered metal wiring structure with interlayer insulating films therebetween. A small cutout is made in a metal wiring when it is desirous to have the metal wiring touch a contact formed in a through hole passing through said cutout. A larger cutout is made in a metal wiring when it is desirous to have the metal wiring remain spaced from a contact formed in a through hole passing through said cutout.
申请公布号 US5760429(A) 申请公布日期 1998.06.02
申请号 US19970834303 申请日期 1997.02.18
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 YANO, KOUSAKU;UEDA, TETSUYA
分类号 H01L21/768;H01L23/522;(IPC1-7):H01L23/528 主分类号 H01L21/768
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