| 摘要 |
PROBLEM TO BE SOLVED: To obtain a polymer capable of providing a chemically amplifying and positive type photoresist composition with an acid-photogenerating agent having a high sensitivity against the ultraviolet rays and capable of providing a good pattern profile regardless of kinds of substrates. SOLUTION: This polymer comprises a repeating unit of formula I [R1 to R3 are H or methyl; R4 is H, an alkyl or an alkoxy; R5 to R7 are each H, methyl, ethyl, t-butyl, tetrahydropyranyl, etc.; (j) is 1-8; (k) is 0-8; (l), (m) and (n) are each a proportion of repeating units with the proviso that (1)+(m)+(n) is 1] and has 2,000-1,000,000 weight average molecular weight expressed in terms of polystyrene, and 1.0-5.0 molecular weight distribution. The objective polymer is obtained, for example, by performing a radical polymerization, etc., of monomers of formulas II, III and IV in an organic solvent such as benzene. |
