| 摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition high in resolution, sensitivity, developability, focus allowance and heat resistance as a positive resist, and capable of forming a pattern good in form reduced in stationary wave effect by incorporating an alkali-soluble resin and a specified compound. SOLUTION: This resin composition comprises the alkali-soluble resin and one of the compounds represented by formulae I and II and a 1,2-quinonediazido compound except the above compounds, and in formulae I and II, D is an H atom or an organic group having the 1,2-quinonediazido group; each of R1 -R7 is an H or halogen atom or an alkyl, aryl, nitro, cyano, hydroxy-alkyl, hydroxyalkoxy, or -OD group; X is an H or halogen atom or a cyano group; and Y is an O or S atom. |
