发明名称 |
PHOTOMASK WITH DEVELOPMENT MEASURING PATTERN AND MEASURING METHOD THEREOF |
摘要 |
A photo mask including a development rate measuring pattern having a plurality of lug-shape pattern dots arranged in a matrix on one of two equal parts of a predetermined region defined at a center portion of the photo mask, and a plurality of depression-shape pattern dots arranged in a matrix on the other part of the predetermined region; the pattern dots in either region being made of the same material as that of the photo mask and having a size gradually varying in a vertical matrix direction and in a horizontal matrix direction. Using the photo mask, it is possible to easily and rapidly measure the development rate uniformity of the development equipment used and to achieve an easy adjustment of the development rate of the development equipment, a simplified adjustment and a reduced adjustment time. |
申请公布号 |
KR0137636(B1) |
申请公布日期 |
1998.06.01 |
申请号 |
KR19930025301 |
申请日期 |
1993.11.25 |
申请人 |
HYUNDAI ELECTRONICS IND. CO.,LTD |
发明人 |
HWANG, JOON |
分类号 |
G03F1/08;G03F1/14;G03F1/44;G03F1/70;G03F7/30;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|