| 摘要 |
A method for forming a test object containing a sinusoidal pattern corresponding to a specified exposure distribution function comprises: providing an exposed and processed intermediate photographic film containing a distorted sinusoidal pattern image having harmonics necessary to produce a substantially undistorted sinusoidal pattern in an exposed and processed test object photographic film; exposing the test object film using the intermediate film containing the distorted sinusoidal pattern image; and processing the exposed test object film, thereby forming a test object containing a substantially undistorted sinusoidal test pattern. |
