发明名称 |
High accuracy fabrication of X-ray masks with optical and E-beam lithography |
摘要 |
X-ray lithography is used in the fabrication of very large scale integrated circuits. Optical lithography techniques are used to create a preliminary mask with coarse features in the preparation of a high resolution x-ray mask. The E-beam tool may register the location of the E-beam relative to the optically written coarse features. This helps the tool to navigate according to the location of specific features./!
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申请公布号 |
US5756234(A) |
申请公布日期 |
1998.05.26 |
申请号 |
US19960663826 |
申请日期 |
1996.06.14 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
GROVES, TIMOTHY R.;MALDONADO, JUAN R. |
分类号 |
G03F1/16;G03F1/14;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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