发明名称 Production of projection mask
摘要 In a process of manufacturing a plurality of projection masks from a substrate at one time, the substrate is subjected only to wet etching on the reverse thereof to form grooves and is separated into the plurality of the projection masks by the use of the grooves formed on the reverse of the substrate./!
申请公布号 US5756237(A) 申请公布日期 1998.05.26
申请号 US19970791572 申请日期 1997.01.31
申请人 HOYA CORPORATION 发明人 AMEMIYA, ISAO
分类号 G03F1/16;G03F1/22;H01L21/027;H01L21/306;(IPC1-7):G03F9/00 主分类号 G03F1/16
代理机构 代理人
主权项
地址
您可能感兴趣的专利