发明名称 TREATMENT OF FLUE GAS FROM CHEMICAL VAPOR DEPOSITION DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To dispense with a large scaled equipment such as a adsorbing column even in the case of high concentration of a harmful material such as tetraethoxy silane in a flue gas to be treated and to facilitate handling by firing a diatom earth used for a filter aid with a fusing agent. SOLUTION: A filter aid supply device 4 for supplying the diatom earth having 2-50μparticle diameter and fired with the fusing agent is mounted at first, an exhausting fan 6 is operated at 1m<3> /min displacement and the surface of a filter is precoated with the diatom earth by adding 100g diatom earth fired with the fusing agent into a filtration dust collector 2 having 1m<2> filtration area and introducing air from an air introducing port 6 to disperse the diatom earth fired with the fusing agent. Next, the waste gas containing tetra ethoxy silane is supplied from a CVD device 1 and the flue gas is recovered from the outlet of the filtration dust collector 2. As a result, the flue gas from the CVD device is efficiently and rapidly made harmless.</p>
申请公布号 JPH10137538(A) 申请公布日期 1998.05.26
申请号 JP19960303201 申请日期 1996.11.14
申请人 ASAHI DENKA KOGYO KK 发明人 KURITA ARIYASU;ONOZAWA KAZUHISA;OTSUKA TAKAHIRO;SASAJIMA MITSUTOSHI
分类号 B01D53/34;B01D46/00;B01D46/02;B01D53/46;C23C16/44;H01L21/205;H01L21/31;(IPC1-7):B01D53/46 主分类号 B01D53/34
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