发明名称 |
TREATMENT OF FLUE GAS FROM CHEMICAL VAPOR DEPOSITION DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To dispense with a large scaled equipment such as a adsorbing column even in the case of high concentration of a harmful material such as tetraethoxy silane in a flue gas to be treated and to facilitate handling by firing a diatom earth used for a filter aid with a fusing agent. SOLUTION: A filter aid supply device 4 for supplying the diatom earth having 2-50μparticle diameter and fired with the fusing agent is mounted at first, an exhausting fan 6 is operated at 1m<3> /min displacement and the surface of a filter is precoated with the diatom earth by adding 100g diatom earth fired with the fusing agent into a filtration dust collector 2 having 1m<2> filtration area and introducing air from an air introducing port 6 to disperse the diatom earth fired with the fusing agent. Next, the waste gas containing tetra ethoxy silane is supplied from a CVD device 1 and the flue gas is recovered from the outlet of the filtration dust collector 2. As a result, the flue gas from the CVD device is efficiently and rapidly made harmless.</p> |
申请公布号 |
JPH10137538(A) |
申请公布日期 |
1998.05.26 |
申请号 |
JP19960303201 |
申请日期 |
1996.11.14 |
申请人 |
ASAHI DENKA KOGYO KK |
发明人 |
KURITA ARIYASU;ONOZAWA KAZUHISA;OTSUKA TAKAHIRO;SASAJIMA MITSUTOSHI |
分类号 |
B01D53/34;B01D46/00;B01D46/02;B01D53/46;C23C16/44;H01L21/205;H01L21/31;(IPC1-7):B01D53/46 |
主分类号 |
B01D53/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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