| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve the treating and recovering capacity of a PFC gas and the efficiency of waste gas by directing the waste gas from a process chamber to the inside of a duct including a multi-way valve, selectively controlling the valve and directing the different fractions of waste gas to the related treating, collecting and exhausting parts. SOLUTION: The device consists of a semiconductor treating chamber 1 and a four-stage dry vacuum pump 2 capable of sucking the waste gas inside from the chamber 1. A three-way valve 3 is arranged at the outlet of the pump 2. The waste gas entering the valve 3 is sucked into the other vacuum pump 4 or 5 by the pressure between the pressure in the chamber 1 and atmospheric pressure in accordance with the setting of the valve 3. The device includes a means for a process tool in the chamber 1 to control the positioning of the valve 3 so that the valve 3 is rightly positioned when a different fraction is detected when the waste gas discharged from the chamber 1 proceeds to the valve 3 in the vacuum pump 2.</p> |
