POSITIVE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a chemically intensifying photoresist having high resolution and capable of preventing occurrence of scum on the bottom of a pattern and forming a good resist pattern. SOLUTION: This composition comprises (a) a resin having groups decomposable by action of an acid and increasable in solubility in an alkaline developing solution and (b) a compound to be allowed to generate an acid and (c) a solvent, and it is necessary to satisfy the condition that this resin (a) has the total chlorine concentration <=50ppm in the solid matter of the resin (a) measured by the fluorescent X-ray analysis.