发明名称 EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To always detect the position of a photosensitive substrate with a stable accuracy by covering at least a part of an alignment means for detecting the position of this substrate at specified air-tightness and controlling the temp. of a part of a gas. SOLUTION: An alignment system (position-detecting means) is composed of members at least among which are sensitive to heat are housed in an enclosure means 42. When the ambient temp. of detecting means 1-9 in the enclosure means 42 rises during the repeating of the position detecting operation in a photosensitive substrate W, a temp. control means 44 controls the air warmed in the enclosure means 42 to avoid excessive temp. rise around the detecting means 1-9, thus keeping ambient temp. of the detecting means 1-9 const. This ensures a stable pattern detection.
申请公布号 JPH10135117(A) 申请公布日期 1998.05.22
申请号 JP19960301114 申请日期 1996.10.25
申请人 NIKON CORP 发明人 NEI MASAHIRO
分类号 G03F9/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F9/00
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