| 摘要 |
PROBLEM TO BE SOLVED: To form a pattern by using a chemically amplifying resist material which has high transparency for far UV rays of <220nm wavelengths and uses a photoacid producing agent having high photoreaction efficiency (photoacid producing efficiency) by incorporating a specified alkylsulfonium salt. SOLUTION: This photosensitive resin compsn. contains an alkyl sulfonium salt compd. of a specified structure as one component, and the photosensitive resin compsn. is used to form a pattern by irradiation of light. The alkylsulfonium salt as the structural element is expressed by formula. In formula, R<1> , R<2> are straight-chain or branched-chain alkyl groups having 1 to 8 carbon atoms (for example, R<1> , R<2> are methyl groups, ethyl groups, n-propyl groups, isopropyl groups, n-butyl groups, sec-butyl groups, tert-butyl groups, pentyl groups, hexyl groups, heptyl groups and octyl groups). |
