SUBSTRATE ROTATION HOLDING APPARATUS AND ROTARY SUBSTRATE TREATING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate rotation holding apparatus capable of surely holding a substrate during the accelerated rotation time and decelerated rotation time, and rotary substrate treating apparatus provided therewith. SOLUTION: On a rotary stage 2, first and second hold pins 7a, 7b for regulating the horizontal position of a substrate 100 are mounted through bearings so as to rotate round a vertical axis. When a substrate rotates, the first hold pins 7a turn in one direction to contact the peripheral end face of the substrate 100 and the second hold pins 7b turn in the reverse direction to contact the peripheral end face of the substrate 100, thus holding the substrate 100 horizontally.