| 发明名称 |
Method and apparatus for transfer of a reticle pattern onto substrate by scanning |
| 摘要 |
A system and method for reproducing isolated images over an entire substrate, by creating multiple adjacent scanned strips of whole images using a unity magnification scanning photolithographic system. |
| 申请公布号 |
AU4823797(A) |
申请公布日期 |
1998.05.22 |
| 申请号 |
AU19970048237 |
申请日期 |
1997.10.14 |
| 申请人 |
MEGAPANEL CORPORATION |
发明人 |
JEFFREY G. KNIRCK;PAUL A. SWANSON |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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