发明名称 IMPURITY PATTERNS PRODUCED BY ION IMPLANTATION
摘要 Stripe or spot patterns of impurities or dopants on a very fine scale are produced in solid surfaces by high energy ion bombardment through at least one thin screening crystal. The ions are channeled through the screening crystal and interact with the next crystal to produce a moire pattern of the bombarding ions at the surface of a substrate. The substrate can be the second crystal or a third solid body intercepting the beam emerging from a thin second crystal.
申请公布号 US3709741(A) 申请公布日期 1973.01.09
申请号 USD3709741 申请日期 1970.09.09
申请人 BELL TEL LABOR INC,US 发明人 GIBSON W,US;HUTSON A,US
分类号 H01L21/00;H01L21/265;(IPC1-7):H01L3/00;H01L7/54 主分类号 H01L21/00
代理机构 代理人
主权项
地址