发明名称 RADIATION-SENSITIVE COMPOSITIONS AND PRINTING PLATES
摘要 Radiation-sensitive compositions, printing plates containing such compositions, imageable by infrared and ultraviolet/visible radiation and imaging method using same. The compositions comprise a thermal-activated acid generator; a cross-linking resin; a binder resin comprising a polymer containing reactive pendant groups selected from hydroxy, carboxylic acid, sulfonamide, and alkoxymethylamides; an infrared absorber; and optionally a UV/visible radiation-activated acid generator for UV/visible sensitization.
申请公布号 WO9821038(A1) 申请公布日期 1998.05.22
申请号 WO1997US20138 申请日期 1997.11.06
申请人 SUN CHEMICAL CORPORATION 发明人 NGUYEN, MY, T.;SARAIYA, SHASHIKANT;SHAH, AJAY;SHIMAZU, KEN-ICHI;PAPPAS, S., PETER;HALLMAN, ROBERT
分类号 B41C1/10;B41M5/36;G03F7/004;G03F7/038;(IPC1-7):B41C1/10 主分类号 B41C1/10
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