| 摘要 |
An optically made, high-efficiency in-line holographic mask (ILHM) for patterning a workpiece and apparatus and methods for performing same. The ILHM (32) combines the functions of a lens and amplitude mask to obviate the need for projection optics. The ILHM is formed using either a non-opaque (MI) or opaque (MII) object mask having transparent regions which can be phase altering, scattering, refracting and/ or diffracting. One method of the invention is illuminating an ILHM to impart a pattern on a workpiece (40). Another method is patterning a workpiece using an ILHM in combination with a lens. Using the ILHM, a holographic real image is disposed at or near the lens image plane. Exposure apparatus (10) for workpieces using ILHMs are also disclosed.
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