| 摘要 |
PROBLEM TO BE SOLVED: To improve the alignment accuracy by separately preparing a reference plate with reference marks and placing this plate on a substrate stage only at the time of a measurement on the base line to execute this measurement. SOLUTION: A main control system 51 controls a reference plate feeder 32 to carry a reference plate B, housed in a reference plate store 31 to a rotary stage 6 on a substrate stage 1, roughly aligns the plate B about the rotation around an axis Z and drives the substrate stage 1 through a driver 8, so that a reticle alignment optical system 10 detects a slit mark through a projection optical system 2. A laser interferometer 4 reads the position of the substrate stage 1 and stores it as a start point for the base line measurement. |
