| 摘要 |
PROBLEM TO BE SOLVED: To accurately correct an exposure pattern without increasing the number of graphics. SOLUTION: In the case of transforming the exposure pattern by this correcting method in a lithographic stage so that a transfer image approximate to a desired design pattern P may be obtained; the visible outline of the desired design pattern P is divided based on a specified rule and plural evaluation points H are added to respective divided edges E. Next, the image of the exposure pattern after exposure is calculated by simulation, and a distance between each evaluation point H of each edge E and a position corresponding to each evaluation point H of the image after exposure is calculated. Then, the distance is inputted in a specified evaluation function and the position of each edge E is corrected based on the outputted value of the evaluation function so as to decide the exposure pattern after exposure. |
