| 摘要 |
PROBLEM TO BE SOLVED: To obtain high sensitivity and high resolution of a resist and to increase adhesion property to a substrate and stability with time during storage after exposure by using a resin having 1-ethoxyethyl group and combining with an acid producing agent having a specified structure. SOLUTION: This chemically amplifying positive resist compsn. contains a resin (A) and an acid producing agent (B). The resin (A) has polymn. units derived from an ester compd. having ethylene type unsatd. bonds, and at least a part of the ester is 1-ethoxyethylester. The acid producing agent (B) is selected from compds. expressed by formulae I-IV. In formula I-IV, R represents alkyl groups, alicyclic hydrocarbon residues, aryl groups, aralkyl groups or camphor groups and may have alkoxy, halogen or nitro substituents. |
