发明名称
摘要 An input circuit of a semiconductor device includes a P type well formed on the main surface of a semiconductor substrate, and an N type region formed on the main surface in the P type well. A P-N junction is formed by the N type region and the P type well. An input voltage is applied to the N type region, which input voltage is applied to an internal circuit formed on the semiconductor substrate. When the P-N junction is rendered conductive by an application of an excessive voltage to the input voltage, the current caused by the excessive voltage is absorbed to the supply potential through the P type region formed in the P well.
申请公布号 JP2754072(B2) 申请公布日期 1998.05.20
申请号 JP19900029141 申请日期 1990.02.07
申请人 MITSUBISHI DENKI KK 发明人 YAMAGATA NARIHITO;MYAMOTO HIROSHI;YAMADA MICHIHIRO
分类号 H01L27/04;H01L21/822;H01L21/8234;H01L21/8242;H01L27/02;H01L27/06;H01L27/088;H01L27/10;H01L27/108 主分类号 H01L27/04
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