发明名称 DETECTING METHOD FOR DEFECT IN FORMED PATTERN
摘要 <p>PROBLEM TO BE SOLVED: To provide a detecting method in which a formation irregularity can be inspected easily and sufficiently over a macro wide range. SOLUTION: A slit pattern 4 which is formed to be the same shape as a required pattern shape is overlapped with a formed pattern 2 which is formed to be the required pattern shape, light 5 which is passed through the slit pattern 4 is transmitted through the formed pattern 2 which is formed to be the required pattern shape, and a defect in the formed pattern 2 can be detected easily. Thereby, the formed pattern 2 to be inspected is irradiated with the light which is passed from the slit pattern 4 which is formed to be the same as the formed pattern, regions outside the formed pattern 2 to be inspected are not irradiated with the light, and a formation irregularity in the formed pattern can be revealed clearly over a macro wide range.</p>
申请公布号 JPH10123015(A) 申请公布日期 1998.05.15
申请号 JP19960275627 申请日期 1996.10.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 INOUE KOJI
分类号 G01B11/30;G01M11/00;G01N21/88;G01N21/93;G01N21/956;G02B5/20;(IPC1-7):G01M11/00 主分类号 G01B11/30
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