| 摘要 |
PROBLEM TO BE SOLVED: To keep the desired shape of a shot region exposed on a photosensitive substrate even if the angles of the transfer mirrors of interferometers by which the positions of stages are measured are changed. SOLUTION: An exposure region 32 is scanned by a wafer 5 on a Zθaxis driving stage 4 synchronously with the scanning of a lighting region 31 by a reticle 12 on a reticle fine driving stage 11 to expose the pattern image of the reticle 12 on a shot region on the wafer 5. The rotation angle of a transfer mirror 7X in the non-scanning direction of the Zθaxis driving stage 4 is obtained from the measured values of a dual-axis interferometer main part (13X1, 13X2), and the rotation angle of the transfer mirror 21X in the non- scanning direction of the reticle fine driving stage 11 is obtained from the measured values of a dual-axis interferometer (14X1, 14X2). In accordance with the rotation angles of the transfer mirrors 7X and 21X, the relative rotation angle between the wafer 5 and the reticle 12 at the time of scanning exposure is corrected.
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