| 摘要 |
PROBLEM TO BE SOLVED: To improve the precision of alignment by previously measuring the shift quantity of a projected image owing to distortion in first and second optical systems and reducing the difference of shift quantity first and second graphic at the transfer size of the second optical system with a wide field until it becomes a value not more than a previous value which is previously decided. SOLUTION: The first graphic by a first aligner is previously transferred on a wafer 1a. The field size of the first aligner is narrower than that of the second aligner. A storage device 40 stores shift quantity by the distortion of the first optical system and that by the distortion of the second optical system with the wide field. In the first graphic on the wafer 1a, the shift quantity and the position of the projected image in the maximum transfer size of the second alighner with the wide field are called from the storage means 40 and the difference of shift quantity between the first optical system and the second optical system is operated in an operation means 42. Then, the transfer size of the second aligner is repetitively reduced until the difference of shift quantity becomes a previously decided specification so as to search the optimum size. |
