发明名称 METHOD OF CUTTING SEMICONDUCTOR WAFER
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of cutting a semiconductor wafer, so as to pelletize a semiconductor wafer simply and securely without the possibility of quality degradation. SOLUTION: A heater block 4 is brought into close contact with the lower surface of a stage 2 for heating the stage 2, transfer heat to a semiconductor wafer 1, and heat it indirectly. When the semiconductor wafer 1 is heated up to a specified temperature, a cooled thermo-module 5 is brought into close contact with the upper surface of the semiconductor wafer 1 under a uniform load, and the semiconductor wafer 1 is rapidly cooled to apply a thermal stress to it. Thereby cracks are generated on dicing lines to pelletize the semiconductor wafer 1.</p>
申请公布号 JPH10125629(A) 申请公布日期 1998.05.15
申请号 JP19960274387 申请日期 1996.10.17
申请人 NEC ENG LTD 发明人 SASAKI HIDEKI;FUKUI KAZUO
分类号 H01L21/301;(IPC1-7):H01L21/301 主分类号 H01L21/301
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