发明名称 CRYOGENIC POLISHING METHOD FOR SOFT ACRYLIC ARTICLES
摘要 <p>A method for polishing articles comprising soft acrylic materials is disclosed. The method includes a cryogenic polishing step and a cleaning step. In the polishing step, a receptacle is charged with polishing beads of various sizes, sodium bicarbonate, a swelling agent and the articles to be polished, for a period of time and at a rotation speed sufficient to remove surface irregularities. Following the polishing step, a receptacle is charged with (a) a cleaning slurry comprising cleaning beads of various sizes and (i) sodium hydroxide and water or (ii) alumina, a surfactant and a solvent and (b) the articles to be cleaned, for a period of time and at a rotation speed sufficient to clean the surface of the polished articles. Agitation is preferably accomplished by a tumbling machine.</p>
申请公布号 WO1998019826(A1) 申请公布日期 1998.05.14
申请号 US1997019881 申请日期 1997.10.31
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