| 摘要 |
PROBLEM TO BE SOLVED: To obtain a chemically amplified positive resist material having no sublimability, very intense light absorption in the far-ultraviolet region and high resolution favorable for miniature processing by using a carboxylic acid derivative having a tricycle aromatic skeleton as the light absorber. SOLUTION: This absorber is represented by formula I or II [wherein R<1> to R<3> are each H, are alkyl, an alkoxyl, an alkenyl or an aryl; R<4> is an (oxygenous) aliphatic, alicyclic or aromatic hydrocarbon group or oxygen; h and R<5> is an acid/unstable group such as a group represented by formula III (wherein R<6> to R<8> are each H, an alkyl, an alkoxyl, an alkoxyalkyl or the like; and R<9> is an alkyl, an aryl or the like); p is 0 or 1; k, h and m are each 0-9; n is 1-10; and k+h+m+n<=10]. A chemically amplified positive resist material is sensitive to an actinic radiation and such high resolution as to be favorable for elaborate processing techniques. The mixing ratio is such that 150-700 pts.wt. organic solvent, 70-90 pts.wt. base resin, 0.5-15 pts.wt. acid generator and 0.01-10 pts.wt. light absorber are used. |
