Vorrichtung zum Behandeln von Substraten

摘要

The invention relates to a device for the treatment of substrates (5) comprising a treatment fluid container (4). The treatment liquid flows upwards into said container from a container bottom, the substrates (5) being placed on at least one substrate support (1). When the substrate support (1) is fitted with discharge openings (9, 10, 11), specially uniform flow conditions are achieved in the entire container area (4), particularly in the area of the substrate supports (1) thereby bringing about a better and more uniform treatment of the substrates (5). It is additionally or alternatively advantageous to also include guiding elements in or near the area of the substrate support (1) to guide the treatment fluid so as to achieve a uniform flow distribution in the fluid container. It is advantageous to integrate at least one ultrasound source in the substrate support (1) specially in connection with the cleaning of the substrate.