WAXING APPARATUS, CONTROL METHOD THEREFOR, HEATER DEVICE FOR USE THEREIN, AND ACCOMMODATOR THEREOF

摘要

A waxing apparatus is equipped with a waxing finishing device (40) moving relative to a skidding surface (11) of a ski plate (10). When an overload is applied to the waxing finishing device (40), the waxing finishing device (40) is stopped. Also, the waxing apparatus is formed so that the waxing finishing device (40) can follow a curve of the ski plate (10). Further, the waxing apparatus is formed so that the ski plate (10) can be fixed with the angle defined between the skidding surface thereof and the horizontal plane on a side where a binding thereof is situated being set to be at an acute angle. Also, the waxing apparatus is equipped with a pantagraph structure (30) which when an obstace (15) exists on the skidding surface of the ski plate (10) expands or contracts in a direction intersecting the moving direction of the waxing finishing device (40) in order to avoid this obstacle (15). Further, an accommodation of the waxing apparatus is equipped with a tray at a lower part thereof