Vorrichtung zum Behandeln von Substraten

摘要

The invention concerns a device for treating substrates (4) in a fluid container (1) containing a treatment fluid, the device having at least one substrate-holder arrangement (3) and a lifting arrangement (8) for lowering and raising the substrate-holder arrangement (3). In order to prevent the lifting arrangement (8) or its structural and operating elements from being damaged or destroyed by chemical vapours, a vapour-suction arrangement is provided which draws off vapours in the region of the lifting arrangement (8), preferably above the surface of the treatment fluid.