发明名称 Sloped substrate support
摘要 <p>The disclosure relates to a substrate support (134) comprising a shelf (135) having a surface (200) sloped at an angle such that the support contacts the substrate (106) substantially at an edge portion of the substrate. The angle of the shelf is greater than an angle of the edge portion of the substrate. The surface of the shelf may be machined or polished to improve its smoothness. The substrate support thereby reduces the effect and severity of scratches on the substrate caused by the support. As a result, the substrate support improves substrate yield. <IMAGE></p>
申请公布号 EP0840358(A2) 申请公布日期 1998.05.06
申请号 EP19970308817 申请日期 1997.11.03
申请人 APPLIED MATERIALS, INC. 发明人 BALLANCE, DAVID S.;BIERMAN, BENJAMIN;HANEY, ROBERT M.;LACOURT, DAVID W.
分类号 H01L21/683;H01L21/673;(IPC1-7):H01L21/00 主分类号 H01L21/683
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