发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To realize improvement in throughput by adjusting a focal positioning method in accordance with the exposure time. SOLUTION: The relation between a transient characteristic 30, indicating the relation between a time from the start of driving of a Z-stage until a focusing position is reached and the position of a photosensitive substrate in the direction of optical axis, and the depth of focus which enables exposure of a predetermined line width is stored. An exposure time T necessary for one shot is allocated to a time (T-T1 ) until the photosensitive substrate enters the depth of focus from outside thereof and a time T1 after the photosensitive substrate enters the depth of focus, on the basis of the depth of focus (b±μ) and the transient characteristic 30. Exposure is started at a time (t1 ) when the photosensitive substrate is outside of the depth of focus.
申请公布号 JPH10116776(A) 申请公布日期 1998.05.06
申请号 JP19960272243 申请日期 1996.10.15
申请人 NIKON CORP 发明人 SAKAKIBARA YASUYUKI
分类号 G03F7/207;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/207
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