发明名称 EVALUATION OF FILM QUALITY FOR WIRING METAL FILM IN SEMICONDUCTOR DEVICE
摘要 PURPOSE:To evaluate the film quality of a wiring metal film by putting a standard electrode and an electrode working as a tested sample in a strong acid etching solution wherein the electric potential generated by the electrodes is detected by a potentiostud. CONSTITUTION:With an aluminum standard electrode 4 and an aluminum measuring sample 5 immersed in an aqueous strong acid solution 2, etching is started. At that time, a natural electrode potential is generated between a platinum electrode 3 and the sample 5 and the potential is recorded by a recorder 9 through a potentiometer 7. Furthermore, a natural electrode potential is simultaneously generated between the electrode 4 and the sample 5 and the potential is recorded by a recorder 10 through a potentiometer 8. The above potentials vary by etching process. Therefore, measured samples can be tested by checking the values by the recorders 9, 10.
申请公布号 JPS5717144(A) 申请公布日期 1982.01.28
申请号 JP19800091744 申请日期 1980.07.07
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 SHIMADA OSAMU
分类号 H01L21/3205;H01L21/66 主分类号 H01L21/3205
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