发明名称 Method and apparatus for minimizing deposition in an exhaust line
摘要 <p>An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between the inlet and the outlet. The apparatus is connected at its inlet to receive the exhaust of the substrate processing chamber, and the collection chamber is structured and arranged to collect particulate matter flowing through the fluid conduit and to inhibit egress of the particulate matter from the collection chamber. A microwave plasma generation system (450) supplies microwave energy within the fluid conduit to form a plasma from etchant gases within the fluid conduit. Constituents from the plasma react with the particulate matter collected in the collection chamber to form gaseous products that may be pumped out of the fluid conduit. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter. <IMAGE></p>
申请公布号 EP0839929(A1) 申请公布日期 1998.05.06
申请号 EP19970118103 申请日期 1997.10.16
申请人 APPLIED MATERIALS, INC. 发明人 RAOUX, SEBASTIAN;FAIRBAIRN, KEVIN;KELKAR, MUKUL;CHEUNG, DAVID;PONNEKANTI, HARI;TANAKA, TSUTOMU
分类号 B01D45/06;B01D53/32;B01D53/46;B01J19/08;B01J19/12;B01J19/24;C23C16/44;C23F4/00;H01J37/32;H01L21/205;H01L21/31;H05H1/24;(IPC1-7):C23C16/44 主分类号 B01D45/06
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