发明名称 SUBSTRATE TEMPERATURE CONTROLLING MECHANISM
摘要 <p>PROBLEM TO BE SOLVED: To monitor the temperature of a substrate without necessitating a special constitution other than a heater in a substrate holder and to easily perform real-time monitoring of the temperature distribution of the substrate. SOLUTION: In a substrate holder 21 holding a substrate 20 by surface contact, a heater 22, which is composed of a plurality of heating blocks 221 and 222 and of resisting heating system, is provided. A monitoring means 23 which monitors the temperature of the heater 22 is composed of current voltage detectors 231 and 232 and a computing element 233 to obtain the resistance value of the heater 22 and calculate the temperature of the heater 22. The temperature distribution of the substrate 20 is monitored based on the temperature data of heating blocks 221 and 222.</p>
申请公布号 JPH10116885(A) 申请公布日期 1998.05.06
申请号 JP19960286139 申请日期 1996.10.08
申请人 ANELVA CORP 发明人 NASHIMOTO KIYOSHI;SAHASE HAJIME;TAKAHASHI NOBUYUKI
分类号 F27B5/14;F27B5/18;H01L21/205;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 F27B5/14
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