| 摘要 |
PROBLEM TO BE SOLVED: To prevent the failure or breakage of the alignment marks previously formed on a substrate at the time of forming color filters by using a bar coating method and a photolithography method. SOLUTION: A marking stage is first executed and the alignment marks 2 consisting of thin-film pieces of prescribed patterns are formed in the peripheral regions of the substrate 1. Next, a coating stage is executed and the substrate 1 is inserted between wire bars 3 in which a colored photosensitive material 5 is immersed and a roller 4 and is subjected to uniform coating by transferring the colored photosensitive material 5 to the substrate 1. The photolithography stage is thereafter executed and a photomask is positioned to the substrate 1 on the basis of the alignment marks 2 and color patterns 6r for one color are formed by exposing the colored photosensitive material 5 via the photomask and developing the material. In a marking stage, the thin-film pieces of the patterns capable of dispersing the stresses from the wire bars 3 are arranged at the alignment marks 2 themselves and/or near the alignment marks 2 in order to prevent the failure of the alignment marks 2 occurring in the contact between the substrate 1 and the wire bars 3 in a succeeding stage. |
