| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a gas refining method by which the high-purity hydrogen (about 99.99999%) needed by a semiconductor factory is produced. SOLUTION: A gaseous mixture contg. H2 is introduced into a dehumidification stage to remove the moisture in the mixture, the mixture freed from moisture is introduced into a decarbonation stage to solidify and remove the gaseous carbon dioxide in the mixture, the mixture free of gaseous carbon dioxide is introduced into a catalysis stage to convert the gaseous carbon dioxide remaining in the mixture to gaseous methane and then introduced into a demethanation stage to solidify and remove the gaseous methane in the mixture, and the mixture freed from gaseous methane is introduced into a low-temp. adsorption stage to adsorb and remove the gaseous methane and and gaseous carbon monoxide remaining in the mixture, and high-purity hydrogen is obtained.</p> |
