发明名称 |
METHOD FOR TREATING PHOTOGRAPHIC LIGHT SENSITIVE MATERIAL FOR LITHOGRA PHY |
摘要 |
PURPOSE:To form dots of high gamma, a shoft foot of characteristic curve, and sharp and good quality with a high rate of development by treating a photographic light sensitive material for lithography containing the emulsion dispersion of a developing agent with a solution of alkaline composition in the presence of a specified compound. |
申请公布号 |
JPS5243429(A) |
申请公布日期 |
1977.04.05 |
申请号 |
JP19750119172 |
申请日期 |
1975.10.02 |
申请人 |
MITSUBISHI PAPER MILLS LTD |
发明人 |
EBATO SHIYOUGO;OKA AKIHARU;TANAKA AKIRA |
分类号 |
G03C5/29;G03C1/06;G03C1/42;G03C1/43 |
主分类号 |
G03C5/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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