发明名称 METHOD FOR TREATING PHOTOGRAPHIC LIGHT SENSITIVE MATERIAL FOR LITHOGRA PHY
摘要 PURPOSE:To form dots of high gamma, a shoft foot of characteristic curve, and sharp and good quality with a high rate of development by treating a photographic light sensitive material for lithography containing the emulsion dispersion of a developing agent with a solution of alkaline composition in the presence of a specified compound.
申请公布号 JPS5243429(A) 申请公布日期 1977.04.05
申请号 JP19750119172 申请日期 1975.10.02
申请人 MITSUBISHI PAPER MILLS LTD 发明人 EBATO SHIYOUGO;OKA AKIHARU;TANAKA AKIRA
分类号 G03C5/29;G03C1/06;G03C1/42;G03C1/43 主分类号 G03C5/29
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