| 摘要 |
PROBLEM TO BE SOLVED: To obtain a chemical amplification type positive type resist compsn. highly transmitting ArF excimer laser light and excellent in sensitivity, resist pattern shape, dry etching resistance and adhesiveness. SOLUTION: This positive type resist compsn. contains acrylic resin whose alkali solubility is varied by the action of an acid and an acid generating agent. The acrylic resin is a polymer or copolymer contg. units derived from acrylic or methacrylic ester of hydroxybicyclo [3,1,1]heptanone or its lower alkyl substituent as constituent units. |
