发明名称 |
Ceramic electrostatic chuck and method |
摘要 |
An electrostatic chuck and method for electrostatically clamping a working member such as a semiconductor wafer to the chuck. The elcetrostatic chuck includes at least one conductive electrode and an insulating layer for separating the conductive electrode from the working member. The insulating layer is composed of a composition containing pyrolytic boron nitiride (PBN) and a carbon dopant in an amount above 0 wt % and less than about 3 wt % such that its electrical resistivity is smaller than 1014 OMEGA -cm. A source of voltage is impressed across the conductive electrode to generate an electrostatic field which causes the working member to be clamped to the chuck.
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申请公布号 |
US5748436(A) |
申请公布日期 |
1998.05.05 |
申请号 |
US19970785082 |
申请日期 |
1997.01.21 |
申请人 |
ADVANCED CERAMICS CORPORATION |
发明人 |
HONMA, JUNICH;MINO, KOTARO;MIYATA, HISAYUKI;INOUE, HARUHIDE |
分类号 |
H01L21/683;H02N13/00;(IPC1-7):H02N13/00 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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