| 摘要 |
The invention provides a semiconductor device having a low threshold voltage and capable of operating at a high speed, and also provides an active matrix display device including such a semiconductor device. The invention also provides a method of producing such a semiconductor device and an active matrix display device. In the invention, a hydrogen supply layer is disposed above semiconductor layers in such a manner that the hydrogen supply layer is apart from the semiconductor layers. A hydrogen diffusion barrier layer for preventing hydrogen from diffusing outward from the hydrogen supply layer is disposed on the hydrogen supply layer in such a manner that the hydrogen diffusion barrier layer is in direct contact with the hydrogen supply layer. The hydrogen diffusion barrier layer is preferably made of a high melting point metal or a compound thereof. The hydrogen supply layer is preferably formed by depositing SiN or amorphous silicon by means of plasma CVD. |
