发明名称 Method of forming raised metallic contacts on electrical circuits
摘要 A method is provided for forming at least one raised metallic contact on an electrical circuit. Generally, this method includes the following steps: providing a composite base substrate which is defined by at least a first conductive layer, a dielectric material and a second conductive layer; removing a portion of the first conductive layer to expose the dielectric material; removing the exposed portion of the dielectric material to the second conductive layer, thereby forming a depression; depositing at least one layer of conductive material on at least side wall portions of the depression; removing the second conductive layer; and completely removing the dielectric material to said first conductive layer thereby forming a raised metallic contact which extends perpendicularly away from the first conductive layer.
申请公布号 US5747358(A) 申请公布日期 1998.05.05
申请号 US19960655017 申请日期 1996.05.29
申请人 W. L. GORE & ASSOCIATES, INC. 发明人 GORRELL, ROBIN E.;FISCHER, PAUL J.
分类号 H05K3/34;H01L21/60;H05K3/06;H05K3/20;H05K3/40;H05K3/46;(IPC1-7):H01L21/44 主分类号 H05K3/34
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