发明名称 Processing system and device manufacturing method using the same
摘要 A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.
申请公布号 US5746562(A) 申请公布日期 1998.05.05
申请号 US19970898568 申请日期 1997.07.25
申请人 CANON KABUSHIKI KAISHA 发明人 HASEGAWA, TAKAYUKI;TANAKA, YUTAKA;FUJIOKA, HIDEHIKO
分类号 C23C14/56;B65G49/07;G03F7/20;H01L21/00;H01L21/027;H01L21/205;H01L21/67;(IPC1-7):F16M1/00 主分类号 C23C14/56
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