发明名称 |
Processing system and device manufacturing method using the same |
摘要 |
A processing system is disclosed which includes first and second chambers, each for accommodating a processing apparatus therein, each chamber being able to be kept gas tight, a coupling member for coupling the processing apparatuses accommodated in the first and second chambers with each other, and an elastic gas tightness holding member for gas tightly sealing portions between the coupling member and the first and second chambers.
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申请公布号 |
US5746562(A) |
申请公布日期 |
1998.05.05 |
申请号 |
US19970898568 |
申请日期 |
1997.07.25 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HASEGAWA, TAKAYUKI;TANAKA, YUTAKA;FUJIOKA, HIDEHIKO |
分类号 |
C23C14/56;B65G49/07;G03F7/20;H01L21/00;H01L21/027;H01L21/205;H01L21/67;(IPC1-7):F16M1/00 |
主分类号 |
C23C14/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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