| 摘要 |
A method and apparatus are provided for the fine cleaning of a thin substrate. The apparatus has a transporter capable of moving the substrate through the apparatus by non-fluid contact with the edges of the substrate alone. In a typical embodiment, the transporter is a series of centrally-tapered rollers. As the substrate is moved through the apparatus by the transporter, its central section is supported by a fluid. Thus, the substrate moves through the apparatus without contact with any solid material except on its edges. As the substrate is moved through the apparatus by the transporter, fluid ejectors wash the substrate by spraying a cleaning fluid against the substrate. After being washed, the substrate is rinsed and then dried. Anti-dragout devices are positioned upstream and downstream of the washing and rinsing sections so as to minimize liquid dragout. The invention has been found very effective in cleaning thin sensitive substrates wherein physical contact with solid devices tends to contaminate the surface. The invention thoroughly cleans such thin substrates with little or no contamination. The invention has been shown to be effective at high throughputs.
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