发明名称 PHOTOSENSITIVE RESIN FOR USE IN PHOTOMECHANICAL PROCESS
摘要 PURPOSE:To obtain a photosensitive resin for use in a screen printing plate or textile printing plate developable only with water, superior in resolution, and in balance between flexibility and toughness, by using a specified modified copolymer. CONSTITUTION:A photosensitive resin for use in a photographic process is obtained by modifying with a Lewis acid capable of providing a proton and a polymerizable vinyl monomer contg. an epoxy group, a copolymer of (A) a polymerizable vinyl monomer having a tertiary nitrogen atom with its lone pair of electrons not conjugated, such as dimethylaminomethylstyrene, vinylpyridine, or N,N-dimethylaminoethyl(meth)acrylate, and (B) a polymerizable vinyl monomer represented by the shown general formula in which R<1>, R<2> are each H or methyl, R<3> is 1-8C alkyl or phenyl or 1-4C alkyl substd. phenyl, and n is 1-10.
申请公布号 JPS58216242(A) 申请公布日期 1983.12.15
申请号 JP19820099622 申请日期 1982.06.10
申请人 MITSUBISHI YUKA KK 发明人 HAYAMA KAZUHIDE;YAMASHITA AKIRA
分类号 G03F7/12 主分类号 G03F7/12
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