Process for forming a layer of patterned photoresist,申请号EP19890202373-传众专利搜索

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发明名称	Process for forming a layer of patterned photoresist
摘要
申请公布号	EP0359342(B1)	申请公布日期	1998.05.06
申请号	EP19890202373	申请日期	1985.08.07
申请人	NCR INTERNATIONAL, INC.;HYUNDAI ELECTRONICS AMERICA;SYMBIOS, INC.	发明人	MAHERAS, GEORGE;HAYWORTH, HUBERT O.;GULETT, MICHAEL R.
分类号	G03F7/26;G03C1/00;G03C1/72;G03C5/00;G03C5/08;G03F7/00;G03F7/095;G03F7/20;G03F7/38;H01L21/027;H01L21/30;(IPC1-7):G03F7/38	主分类号	G03F7/26
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