Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte,申请号DE1995601865-传众专利搜索

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发明名称	Fotopolymerisierbare Zusammensetzung und fotoempfindliche lithographische Druckplatte
摘要
申请公布号	DE69501865(D1)	申请公布日期	1998.04.30
申请号	DE1995601865	申请日期	1995.09.01
申请人	MITSUBISHI CHEMICAL CORP., TOKIO/TOKYO, JP	发明人	NAGASAKA, HIDEKI, YOKOHAMA RESEARCH CENTER, AOBA-KU, YOKOHAMA-SHI, KANAGAWA 227, JP;URANO, TOSHIYUKI, YOKOHAMA RESEARCH CENTER, AOBA-KU, YOKOHAMA-SHI, KANAGAWA 227, JP;MURATA, AKIHISA, YOKOHAMA RESEARCH CENTER, AOBA-KU, YOKOHAMA-SHI, KANAGAWA 227, JP
分类号	G03F7/029;(IPC1-7):G03F7/029	主分类号	G03F7/029
代理机构		代理人
主权项
地址

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